@article{JETPL.121.945,
    title = {Thermally Stable Ferroelectric HfO2:Al2O3 (10:1) in Silicon-on-Insulator and Silicon-on-Sapphire Heterostructures after Rapid Thermal Annealing Treatments and Oxidation-Induced Silicon Thinning},
    author = {Popov, V. P. and Antonov, V. A. and Zhilitskii, V. E. and Lomov, A. A. and Myakon?kikh, A. V. and Rudenko, K. V.},
    journal = {JETP Lett.},
    volume = {121},
    issue = {12},
    pages = {902},
    year = {2025},
    doi = {10.1134/S0021364025606359},
    url = {http://jetpletters.ru/ps/0/article_36710.shtml},
    note = {[Pisma v ZhETF 121, 945 (2025)]}
}